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The threshold voltage of a MOSFET can be lowered by

1. using a thinner gate oxide
2. reducing the carrier concentration in the substrate
3. increasing the carrier concentration in the substrate Of these statements :

  • A.3 alone is correct.
  • B.1 and 2 are correct
  • C.1 and 3 are correct
  • D.2 alone is correct

Answer: B

Statements 1 and 2 are correct. The threshold voltage of a MOSFET is


\[ V_{T} = V_{FB} + 2\phi_{F} + \frac{Q_{d}}{C_{ox}} \]

where \(Q_{d} = \sqrt{2\epsilon q N_{A}(2\phi_{F})}\) is the depletion charge.


A thinner gate oxide raises \(C_{ox}\) and lowers the last term, so statement 1 is right. Reducing the substrate carrier concentration lowers the depletion charge and also lowers \(2\phi_{F}\), so \(V_{T}\) falls and statement 2 is right. Increasing the concentration does the opposite and raises \(V_{T}\), so statement 3 is wrong. That rules out the options that contain 3.

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